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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Seongbo Shim, Youngsoo Shin

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Springer International Publishing img Link Publisher

Naturwissenschaften, Medizin, Informatik, Technik / Maschinenbau, Fertigungstechnik

Beschreibung

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

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Schlagwörter

Inverse DSA, DSA.Aware Placement, DSA-Aware Routing, DSA Verification, Physical Design for DSA, DSA-Aware OPC, VLSI CAD for DSA, DSA-Friendly VLSI Design, Nanolithography, DSA-Aware Mask Optimization, Multi-Patterning with DSA, Computational Litography